Target for the sputtering cathode of a vacuum coat

专利名称：Target for the sputtering cathode of a

vacuum coating apparatus and method forits manufacture

发明人：Norbert Wollenberg申请号：US08/719614申请日：19960925公开号：US06039855A公开日：20000321

摘要：A frame (3, 4, 5, . . . 7) at least partially surrounds the target material (19), andserves to mount the target on the cathode backing plate (9), with a separating film orinterlayer (20) of soft material disposed between the frame and the cathode backingplate. The frame (3, 4, 5, . . . 7) is provided with a plurality of projections (3a, 3b, . . . 4a, 4b, .. . 7a, 7b . . . ) affixed to the frame members (3, 4, 5, . . . 7) and extending into the targetmaterial in order to hold the target material (19) in the spaces (A, B, C) surrounded by theframe members. The target is preferably cast directly into the frame while the frame isfixed to a stainless steel plate, then removed together with the frame after cooling andmounted to the cathode plate.

申请人：LEYBOLD MATERIALS GMBH

代理机构：Fulbright & Jaworski, LLP

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