Device for Processing Plasma with a Circulation of

专利名称：Device for Processing Plasma with a

Circulation of Process Gas in MultiplePlasmas

发明人：Hermann SCHLEMM,Mirko KEHR,Erik

ANSORGE,Daniel DECKER

申请号：US15122638申请日：20150303

公开号：US20170069468A1公开日：20170309

专利附图：

摘要：The device for plasma processing as per the invention is comprised of a

processing chamber with at least two plasma processing zones with process gas flowingthrough them, a gas inlet that is suitable for feeding the process gas to the at least twoplasma processing zones, and a gas outlet that is suitable for discharging exhaust gasfrom the processing chamber, as well as a circulation unit with a circulation line and acirculation pump, wherein the circulation unit is suitable for feeding at least a portion ofthe exhaust gas into the gas inlet and wherein the exhaust gas that is fed into the gasinlet is a mixture of gases that are discharged from at least two of the plasma processingzones. Because of the mixture of exhaust gases from at least two of the plasmaprocessing zones and their renewed feeding into the gas inlet, the components of theprocess gas from the at least two plasma processing zones that have already beenconverted, but also those that have not yet been converted, are mixed and ahomogenization of the process gas is therefore achieved that is fed into the plasmaprocessing zones. This reduces the inhomogeneity of the plasma processing amongindividual substrates that arises from differences in the plasma process in differentplasma processing zones.

申请人：MEYER BURGER (GERMANY) AG

地址：Hohenstein-Ernstthal DE

国籍：DE

更多信息请下载全文后查看